Trifluorosilane is the chemical compound with the formula F<sub>3</sub>HSi. At standard temperature and pressure, trifluorosilane is a colorless gas. Note that the free radical F<sub>3</sub>Si is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.
Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF<sub>3</sub> and HSiCl<sub>3</sub>. HSiCl<sub>3</sub> is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 ðC.
Formation has also been reported in certain etching operations of silicon.
The electric dipole moment of trifluorosilane is 1.26 debye. The length of the silicon to fluorine bond is 1.555 à, Si-H length is 1.55 à, and â FSiF is 110ð.